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Optimization and modelling of preparation conditions of CuS thin films deposited by successive ionic layer adsorption and reaction (SILAR) method using response surface methodology
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Y. YÜCEL Et Al. , "Optimization and modelling of preparation conditions of CuS thin films deposited by successive ionic layer adsorption and reaction (SILAR) method using response surface methodology," Journal of Materials Science: Materials in Electronics , vol.26, no.6, pp.4105-4112, 2015

YÜCEL, Y. Et Al. 2015. Optimization and modelling of preparation conditions of CuS thin films deposited by successive ionic layer adsorption and reaction (SILAR) method using response surface methodology. Journal of Materials Science: Materials in Electronics , vol.26, no.6 , 4105-4112.

YÜCEL, Y., YÜCEL, E., & Gökhan, D., (2015). Optimization and modelling of preparation conditions of CuS thin films deposited by successive ionic layer adsorption and reaction (SILAR) method using response surface methodology. Journal of Materials Science: Materials in Electronics , vol.26, no.6, 4105-4112.

YÜCEL, YASİN, ERSİN YÜCEL, And Didem Gökhan. "Optimization and modelling of preparation conditions of CuS thin films deposited by successive ionic layer adsorption and reaction (SILAR) method using response surface methodology," Journal of Materials Science: Materials in Electronics , vol.26, no.6, 4105-4112, 2015

YÜCEL, YASİN Et Al. "Optimization and modelling of preparation conditions of CuS thin films deposited by successive ionic layer adsorption and reaction (SILAR) method using response surface methodology." Journal of Materials Science: Materials in Electronics , vol.26, no.6, pp.4105-4112, 2015

YÜCEL, Y. YÜCEL, E. And Gökhan, D. (2015) . "Optimization and modelling of preparation conditions of CuS thin films deposited by successive ionic layer adsorption and reaction (SILAR) method using response surface methodology." Journal of Materials Science: Materials in Electronics , vol.26, no.6, pp.4105-4112.

@article{article, author={YASİN YÜCEL Et Al. }, title={Optimization and modelling of preparation conditions of CuS thin films deposited by successive ionic layer adsorption and reaction (SILAR) method using response surface methodology}, journal={Journal of Materials Science: Materials in Electronics}, year=2015, pages={4105-4112} }